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External Antenna for Ion Sources

IB-1826

APPLICATION:

  • Ion sources

ADVANTAGES:

  • Has a long lifetime
  • Is easily installed
  • Results in less sputtering on the plasma chamber wall
  • Enables the design of compact ion sources

ABSTRACT: Ka-Ngo Leung and colleagues have developed a robust, efficient antenna system that is placed outside the plasma chamber of an ion source. Internal antennas are normally covered with a dielectric material such as porcelain or quartz in order to reduce sputtering and to enhance plasma source efficiency, but these exhibit limited lifetime due to mechanical failures.

Besides having a long lifetime, the external antenna system has several advantages over internal antennas. First, repairs can be made without opening the plasma chamber. Second, a large number of turns can be made in the antenna coil, allowing the discharge to be easily operated in the inductive instead of the capacitive mode. This feature results in less sputtering on the metallic chamber wall. Third, plasma loss to the antenna structure is greatly reduced when the antenna is located outside the chamber, enabling the design of compact ion sources.

STATUS: Patent pending ; available for licensing or collaborative research

FOR ADDITIONAL INFORMATION:

Please see U.S. Patent #6,975,072 and Published Patent Application

REFERENCE NUMBER: IB-1826

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