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Low Defect, High Deposition Rate Sputtering with a Plasma Lens
IB-2823

APPLICATIONS OF THE TECHNOLOGY:

ADVANTAGES:

ABSTRACT:

Berkeley Lab researcher André Anders has developed a plasma lens for enhancing the quality and rate of sputter deposition onto a substrate. The plasma lens serves to focus low energy positively charged ions onto the substrate while deflecting negatively charged ions and, at the same time, due to the line of sight positioning of the lens, allowing free passage of neutrals from the target to the substrate. This is a particularly useful arrangement in the deposition of oxide and fluoride films.

Previous approaches, such as shielding, increasing process gas pressure or placing substrates off-axis, that were intended to reduce the flow of negatively charged ions in thin film sputtering had the effect of significantly reducing process deposition rate.

STATUS: Published U. S. Patent application, publication no. US2013/0043121 available at www.uspto.gov. Available for licensing or collaborative research.

DEVELOPMENT STAGE: Supporting experiments completed

FOR MORE INFORMATION
A. Anders and J. Brown, "A plasma lens for magnetron sputtering," IEEE Trans. Plasma Sci., vol. 39, pp. 2528-2529, 2011.

SEE THESE OTHER BERKELEY LAB TECHNOLOGIES IN THIS FIELD:

Improvements to High Power Impulse Magnetron Sputtering, IB-2473

REFERENCE NUMBER: IB-2823

See More Materials Technologies